You are running it out of spec.
You use whichever runs stable at whatever speed you want.
They are not the same.
Temperature, casing heat dissipation, thicknesses in the layers, doping differences over a wafer, changes in the masking and over a wafer.and that's just one wafer, different crystalline structures and strains through the ingot and slices.
Different slices, wire thicknesses, etc, and that's probably just the PMIC let alone everything else.
And then the variation in input voltages and reference points.
What is the expected tolerance for it running in spec? And then remember you are running it you of specification.
As an Ex. III-V semiconductor engineer, with a wider knowledge from our silicon and other substrates sections..
You should have a go.
You use whichever runs stable at whatever speed you want.
They are not the same.
Temperature, casing heat dissipation, thicknesses in the layers, doping differences over a wafer, changes in the masking and over a wafer.and that's just one wafer, different crystalline structures and strains through the ingot and slices.
Different slices, wire thicknesses, etc, and that's probably just the PMIC let alone everything else.
And then the variation in input voltages and reference points.
What is the expected tolerance for it running in spec? And then remember you are running it you of specification.
As an Ex. III-V semiconductor engineer, with a wider knowledge from our silicon and other substrates sections..
You should have a go.
Statistics: Posted by bensimmo — Sun Feb 11, 2024 6:55 pm